Hydrogen incorporation in Ni-P films prepared by electroless deposition
Identifieur interne : 000306 ( France/Analysis ); précédent : 000305; suivant : 000307Hydrogen incorporation in Ni-P films prepared by electroless deposition
Auteurs : M. Saaoudi [Maroc, France] ; E. Chassaing [France] ; M. Cherkaoui [Maroc] ; M. Ebntouhami [Maroc]Source :
- Journal of applied electrochemistry [ 0021-891X ] ; 2002.
Descripteurs français
- Pascal (Inist)
- Etude expérimentale, Dépôt par oxydoréduction, Réaction électrochimique, Alliage base nickel, Phosphore Alliage, Alliage binaire, Electrode, Cuivre, Effet milieu, pH, Sodium Hypophosphite, Nickel Sulfate, Effet concentration, Microbalance quartz, Stabilité thermique, Analyse thermique, Calorimétrie différentielle balayage, Thermodésorption, Hydrogène.
- Wicri :
English descriptors
- KwdEn :
- Binary alloy, Concentration effect, Copper, Differential scanning calorimetry, Electrochemical reaction, Electrodes, Electroless plating, Experimental study, Hydrogen, Medium effect, Nickel Sulfates, Nickel base alloys, Phosphorus Alloys, Quartz microbalance, Sodium Hypophosphites, Thermal analysis, Thermal stability, Thermodesorption, pH.
Abstract
Electroless NiP films, with 12 to 16 wt % P, were deposited from a moderately acid solution. Thermogravimetric analysis indicates the presence of occluded hydrogen in the layers, which desorbs upon heating. The amount of incorporated hydrogen decreases when the pH of the solution or the nickel sulfate concentration is increased; by contrast it increases with hypophosphite concentration. Cyclic voltammetry, using an electrochemical quartz crystal microbalance, confirms the existence of parasitic reactions, namely the reduction of protons of the solvent during the cathodic process and oxidation of hydrogen during the dissolution of the layers. This behaviour is in qualitative agreement with the proposed reaction scheme.
Affiliations:
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- to stream Main, to step Curation: 000A27
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Pascal:03-0263673Le document en format XML
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<front><div type="abstract" xml:lang="en">Electroless NiP films, with 12 to 16 wt % P, were deposited from a moderately acid solution. Thermogravimetric analysis indicates the presence of occluded hydrogen in the layers, which desorbs upon heating. The amount of incorporated hydrogen decreases when the pH of the solution or the nickel sulfate concentration is increased; by contrast it increases with hypophosphite concentration. Cyclic voltammetry, using an electrochemical quartz crystal microbalance, confirms the existence of parasitic reactions, namely the reduction of protons of the solvent during the cathodic process and oxidation of hydrogen during the dissolution of the layers. This behaviour is in qualitative agreement with the proposed reaction scheme.</div>
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